Deposition of TiN Films onto Glaze of Porcelain by Reactive Sputtering
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چکیده
منابع مشابه
Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering
Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a reactive d.c. magnetron sputtering process. Superlattice period, also known as modulation wavelength (A), was controlled by controlling the dwell time of the substrate underneath Ti and Cr targets. X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the fdms....
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Deposition of Visible Light Active Photocatalytic Bismuth Molybdate Thin Films by Reactive Magnetron Sputtering
Bismuth molybdate thin films were deposited by reactive magnetron co-sputtering from two metallic targets in an argon/oxygen atmosphere, reportedly for the first time. Energy dispersive X-ray spectroscopy (EDX) analysis showed that the ratio of bismuth to molybdenum in the coatings can be effectively controlled by varying the power applied to each target. Deposited coatings were annealed in air...
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Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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Ti-6Al-4V alloy attracting attention as a biomaterial features excellent mechanical properties and corrosion resistance, and super plasticity, so enables the forming of denture bases of complicated shapes. However, this alloy contains aluminum and vanadium liable to do serious harm to human bodies [1,2], so actual use will require prevention of direct contact with biological tissues. In our pre...
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ژورنال
عنوان ژورنال: Journal of the Ceramic Society of Japan
سال: 1991
ISSN: 0914-5400,1882-1022
DOI: 10.2109/jcersj.99.1219